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| No.12478548

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Information Name: | Weifang Dongye Steel, [budget] Weifang clean room, clean room Weifang |
Published: | 2014-06-08 |
Validity: | 0 |
Specifications: | Limitation |
Quantity: | |
Price Description: | |
Detailed Product Description: | Clean space temperature and humidity are mainly determined according to process requirements, but meet the technical requirements under the 2014 Weifang clean room conditions, should take into account the person's sense of comfort. With the improvement of air cleanliness requirements, process requirements for the emergence of increasingly stringent temperature and humidity trends. After specific process temperature requirements but also enumerated, but as a general rule, due to machining accuracy more sophisticated, so the temperature fluctuation range of demands smaller and smaller. For example, in the production of large scale integrated circuit lithography exposure process, as the thermal expansion coefficient of glass and the mask and the wafer requires smaller difference. 100 um diameter wafers, the temperature rises one degree, it caused a 0.24um linear expansion, so there must be a constant temperature ± 0.1 degrees, while requiring humidity is generally lower, because after people sweat, the product will have pollution, especially Sodium is afraid semiconductor plant, which plant should not exceed 25 degrees. High humidity generated more questions. When the relative humidity exceeds 55%, the walls of the cooling water, condensation, if it occurs at sophisticated devices or circuits, can cause a variety of accidents. Relative humidity at 50% rust. Besides the latest Weifang clean room, the water molecules in the air by the silicon surface adhesion of dust chemical adsorption on the surface when the humidity is too high resistance difficult to remove. The higher the relative humidity of the clean room Weifang, adhesion is difficult to remove, but when the relative humidity is below 30%, due to an electrostatic force and the particles are easily adsorbed on the surface, while a large number of semiconductor devices prone to breakdown. For optimum temperature range of wafer production 35-45%. Chaotic flow (Turbulent Flow) air from the air box via the duct and clean indoor air filter (HEPA) into the clean room clean room Weifang budget by the clean room wall or overhead compartments on both sides of the floor back to the wind. Non-linear flow of irregular movement of turbulence or vortex state. This pattern applies to rank 1,000 to 100,000 class clean room. Advantages: simple structure, low cost construction of the system, the expansion chamber is relatively easy to clean, and in some places special purposes, may be used in clean bench, clean room class improved. Cons: turbulence caused by dust particles in indoor spaces floating difficult to discharge, easily contaminated process products. In addition, if the system stops functioning reactivation, want of cleanliness needs, often takes quite a long period of time is required. Weifang Dongye Steel, [budget] Weifang clean room, clean room provided by Weifang Weifang Dongye Steel. Search for "steel works, purification plant, activities of the board, rock wool composite panels and other" tricky suppliers, network operators choose to have the whole alliance certification: Weifang Dongye Steel Engineering Co., Ltd. (www.sdjinquan.com), trustworthiness and reliability, now click on the "Business League Support" on page live chat with us now! |
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Copyright © GuangDong ICP No. 10089450, Weifang Dongye Steel Structure Engineering Co., Ltd. All rights reserved.
Technical support: ShenZhen AllWays Technology Development Co., Ltd.
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You are the 14531 visitor
Copyright © GuangDong ICP No. 10089450, Weifang Dongye Steel Structure Engineering Co., Ltd. All rights reserved.
Technical support: ShenZhen AllWays Technology Development Co., Ltd.
AllSources Network's Disclaimer: The legitimacy of the enterprise information does not undertake any guarantee responsibility